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ESD phenomena in graded junction devices
Show Abstract
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Duvvury, C., Rountree, R.N., Stiegler, H.J., Polgreen, T., Corum, D.
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1989 |
[No source information available]
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8
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Physical limitations of molecular electronic devices
Show Abstract
|
Marvan, M.
|
1989 |
Vacuum
39 (1), pp. 29
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0
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Recent developments in real time structured analysis
Show Abstract
|
Kennedy, A.S.
|
1989 |
Computer
Physics Communications
57 (1-3), pp. 561
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0
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Investigation of the time dependence of current degradation in MOS
devices
Show Abstract
|
Rakkhit, R., Peckerar, M.C., Yao, C.T.
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1989 |
[No source information available]
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1
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4 PMOS/2 NMOS vertically stacked CMOS-SRAM with 0.6 μm design rule
Show Abstract
|
Inoue, Y., Ipposhi, T., Wada, T., Ichinose, K., Nishimura, T., Akasaka, Y.
|
1989 |
Digest
of Technical Papers - Symposium on VLSI Technology
, pp. 39-40
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0
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Electromigration of ionized cluster beam deposited aluminum
metallizations
Show Abstract
|
Hummel, R.E.
|
1989 |
[No source information available]
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0
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Novel stacked capacitor cell for 64 Mb DRAM
Show Abstract
|
Wakamiya, W., Tanaka, Y., Kimura, H., Miyatake, H., Satoh, S.
|
1989 |
Digest
of Technical Papers - Symposium on VLSI Technology
, pp. 69-70
|
4
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Reliability study of Au-Sn eutectic bonding with GaAs dice
Show Abstract
|
Matijasevic, Goran S., Lee, Chin C.
|
1989 |
[No source information available]
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4
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Electromigration interconnect lifetime under AC and pulse DC
stress
Show Abstract
|
Liew, B.K., Cheung, N.W., Hu, C.
|
1989 |
[No source information available]
|
7
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Trends in the future: data acquisition architectures
Show Abstract
|
Gaines, I.
|
1989 |
Computer
Physics Communications
57 (1-3), pp. 560
|
0
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|
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Dopant redistribution in dual gate W-polycide CMOS and its improvement
by RTA
Show Abstract
|
Hayashida, H., Toyoshima, Y., Suizu, Y., Mitsuhashi, K., Iwai, H., Maeguchi, K.
|
1989 |
Digest
of Technical Papers - Symposium on VLSI Technology
, pp. 29-30
|
5
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Integrated optoelectronics-VLSI packaging technology
Show Abstract
|
Lin-Hendel, C.G., Bertram, W.J., Dhanaliwala, M.S., Pimpinella, R.J., Segelken, J.M., Tai, K.L.
|
1989 |
Digest
of Technical Papers - Symposium on VLSI Technology
, pp. 43-44
|
0
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New reliability problem associated with Ar ion sputter cleaning of
interconnect vias
Show Abstract
|
Tomioka, Hideki, Tanabe, Shin-ichi, Mizukami, Koichiro
|
1989 |
[No source information available]
|
1
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Physical aspects of charged particle track structure
Show Abstract
|
Ritchie, R.H., Hamm, R.N., Turner, J.E., Wright, H.A., Ashley, J.C., Basbas, G.J.
|
1989 |
Nuclear
tracks
16 (2-3), pp. 141-155
|
15
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Study of boron penetration through thin oxide with p+-polysilicon
gate
Show Abstract
|
Sun, J.Y.-C., Wong, C., Taur, Y., Hsu, C.-H.
|
1989 |
Digest
of Technical Papers - Symposium on VLSI Technology
, pp. 17-18
|
9
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New technology for bipolar emitters in the deep sub-micron range
Show Abstract
|
Burghartz, Joachim N., Ginsberg, Barry J., Mader, Siegfried R.
|
1989 |
Digest
of Technical Papers - Symposium on VLSI Technology
, pp. 57-58
|
0
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| | | | |
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Verification of the SIMULATE-3 pin power distribution calculation
Show Abstract
|
DiGiovine, A.S., Gorski, J.P., Tremblay, M.A.
|
1989 |
Nuclear
Science and Engineering
103 (4), pp. 420-426
|
0
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| | | | |
|
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Optimum fuel and power distribution for a pressurized water reactor
burnup cycle
Show Abstract
|
Stillman, J.A., Chao, Y.A., Downar, T.J.
|
1989 |
Nuclear
Science and Engineering
103 (4), pp. 321-333
|
6
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| | | | |
|
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Stress-driven diffusive voiding of aluminum conductor lines
Show Abstract
|
Yost, F.G., Amos, D.E., Romig Jr., A.D.
|
1989 |
[No source information available]
|
9
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|
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Proceedings of the International Conference on Computing in High Energy
Physics
Show Abstract
|
[No author name available]
|
1989 |
Computer
Physics Communications
57 (1-3)
|
0
|
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